N2 Purge Stocker
Storage Devices, Manufacturing and Sales. Last Modify :
- Keeping because of the hypoxic atmosphere is possible by a little amount of the N2 use.
- It is possible to use it for the natural oxide film controls of the wafer and the glass substrate, etc. and the inhibited oxidations in the moisture uptake prevention and the precision part.
- It differs from desiccator only of throwing N2, the N2 substitution speed is early, all the storage shelves are independent, and the oxygen density of other storage shelves does not change even when one door is opened.
- The oxygen density of each shelf decreases uniformly because it sets up the restriction and the purge nozzle of each storage shelf.